Description
| Product ID: | 9781489979438 |
| Product Form: | Paperback / softback |
| Country of Manufacture: | US |
| Title: | Atomic Layer Deposition for Semiconductors |
| Authors: | Author: Cheol Seong Hwang |
| Page Count: | 263 |
| Subjects: | Electrochemistry and magnetochemistry, Electrochemistry & magnetochemistry, Energy technology and engineering, Electrical engineering, Electronics engineering, Electronic devices and materials, Computer hardware, Energy technology & engineering, Electrical engineering, Electronics engineering, Semi-conductors & super-conductors, Computer hardware |
| Description: | Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device. This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes. |
| Imprint Name: | Springer-Verlag New York Inc. |
| Publisher Name: | Springer-Verlag New York Inc. |
| Country of Publication: | GB |
| Publishing Date: | 2016-08-23 |
